FREMONT, Calif., Feb. 28, 2008 (PRIME NEWSWIRE) -- Legacy Holding, Inc. (Pink Sheets:LGYH) announces that it is manufacturing a HF: DryZone(tm) wetstation in order to fulfill a recently announced second purchase order from Tyco International, Ltd. The fully automated, cassette-less wetstation provides wafers with either hydrophilic or hydrophobic surface terminations using the patented DryZone(tm) process.
The relationship started in 2003 when Tyco investigated the surface preparation capabilities of the DryZone(tm) process and has grown since. In May 2007, Tyco completed qualification of Legacy's DryZone(tm) Hydrophilic: Hydrophobic Wafer Drying System. A second expanded system, which was ordered in Q4-2007 for delivery in Q1-2008, is being constructed and will be ready for shipment late March. Legacy looks forward to many years of service and mutual benefits in its continued partnership with Tyco Electronics.
In the first nine months of 2007, Legacy also received customer sign-off acceptance documents on two of its robotic wet process benches for Semiconductor manufacturers that included Micrel Semiconductor and Cree.
More on the company's equipment manufacturing capabilities:
Legacy produces automated wet process equipment for the semiconductor, flat panel, solar cell, and MEMS industries. The equipment utilizes both patented process and hardware technologies developed by Legacy Systems. The heart of the process technology is a state-of-the-art ozone cleaning and drying system. The Ozone technology base eliminates or reduces hazardous chemistries and hazardous process conditions while increasing process performance and wafer throughput.
The station is self contained with on-board wafer automation (robotics), leading edge wafer carriers which reduce particle generation and increase robotic handling reliability, integrated chemical generation/supply for highest chemical purity available, patented process surface preparation technology, environmental safety monitors, and high component reliability.
For more information visit: http://www.legacysystemsinc.com or http://www.lgyh.msprofit.com
About Legacy Holding Inc.
Legacy Holding Inc. provides wafer cleaning and stripping technology to the semiconductor and related industries. Under the direction of its President and CEO, Robert Matthews, Legacy has developed and patented new, and what management believes are breakthrough processes that employ "Green Chemistry" to produce an environmentally safe process for photoresist stripping and cleaning of any size silicon wafer. Legacy delivers its cleaning technology through its own state of the art benches that employ the latest in robotic systems, or via specially designed modules that can be integrated into existing bench technology provided by other equipment manufacturing companies. Legacy Systems has been in operations since 1989.
Forward-Looking Statements
This press release contains forward-looking statements regarding the future plans of Legacy Systems and Legacy Holding, Inc. and its business and products. These forward-looking statements involve risks and uncertainties and actual results could differ materially from those predicted in any such forward-looking statements. Except for historical information, all of the statements, expectations and assumptions contained in the foregoing are forward-looking statements. The realization of any or all of these expectations is subject to a number of risks and uncertainties and it is possible that the assumptions made by management may not materialize. Statements in this press release involve risks and uncertainties; actual results may differ from the forward-looking statements. Sentences or phrases that use such words as "believes," "anticipates," "plans," "may," "hopes," "can," "will," "expects," "is designed to," "with the intent," "potential" and others indicate forward-looking statements, but their absence does not mean that a statement is not forward-looking. The Company undertakes no obligation to publicly release the results of any revisions to these forward-looking statements that may be made to reflect events or circumstances after the date hereof or to reflect the occurrence of unanticipated events.