Entegris to Debut Innovative Customer Solutions At SEMICON West 2008 and Intersolar North America 2008


ADVISORY, July 11, 2008 (PRIME NEWSWIRE) --


 WHAT:    Entegris Inc. will debut six new customer solutions to help
          semiconductor manufacturers lower costs and increase yields
          at SEMICON West 2008 and Intersolar North America 2008 in
          San Francisco. Highlighted products include:

          *  Torrento(tm) 15nm Retention Rating Non-Dewetting Teflon(r)
             Filter: Liquid filter for wet etch and clean processes
             capable of retaining particles as small as 15nm without
             sacrificing flow rate.
          *  Impact(r) 5nm Filter: Industry's first 5nm photoresist
             filter.
          *  SiLVERSET Chemical Air Filters: Innovative filter media
             designed to control airborne molecular contaminants in the
             photolithography bay.
          *  Scanner Pre-Filter System: Provides lithography scanners
             with enhanced protection from contamination due to low
             molecular weight silicon organic compounds.
          *  IntelliGen(r) HV Dispense System: Enables faster, safer
             changeout of filters through the precision dispense system
             for high viscosity fluids.
          *  450mm Wafer Handling Products: A complete set of prototype
             shipper and process carriers for handling 450mm wafers.

 WHEN:    Tuesday through Thursday, July 15-17, 2008
          10 a.m. - 6 p.m. Tuesday and Wednesday
          10 a.m. - 4 p.m. Thursday

 WHERE:   SEMICON West / Intersolar North America
          Moscone Center
          South Hall #1020 / West Hall #9241
          747 Howard Street
          San Francisco, CA, USA

The Entegris, Inc. logo is available at http://www.primenewswire.com/newsroom/prs/?pkgid=5231



            

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