Entegris Introduces Compact, Energy-Efficient Gas Purification System for High-Flow Applications

First 20,000 slpm System to Deliver Part-Per-Trillion Contamination Control in Smallest Available, Energy-Efficient Package


CHASKA, Minn., Feb. 23, 2009 (GLOBE NEWSWIRE) -- Entegris, Inc. (Nasdaq:ENTG) introduced the most compact, energy-efficient gas purification system for high-flow, semiconductor manufacturing applications. Using XCDA(r) (eXtreme Clean Dry Air), which has proven both safer and more effective than other gases employed in wafer production, the Aeronex(r) Gas Purification System (AGPS 2HZ2) purifies 20,000 slpm of purge gases used in dry and immersion-based 193 nm lithography tools.

The uniquely designed AGPS 2HZ2 offers the smallest footprint available in a high-flow system, conserving valuable real estate within the subfab area while reducing gas and power consumption. The 2HZ2's design utilizes proven purification technology, incorporating three purifier beds, two of which are working in parallel to maintain a reliable stream of purge gas, while the third bed is either regenerating or in stand-by mode. This environmentally friendly, proprietary purification process occurs automatically at ambient temperatures minimizing energy requirements, while the purifier media is also automatically regenerated and restored to its original capacity.

"Entegris has raised the bar in high-flow systems with the AGPS 2HZ2," says Chris Vroman, Marketing Director for Entegris Gas Microcontamination Control Business Unit. "With double the flow rate capacity and an average floor space savings of 60 percent over comparable units, the AGPS 2HZ2 is a market first. Based on proven XCDA purification technology, the introduction of the AGPS represents Entegris' commitment to evolve in line with our customers needs to meet the most stringent high-flow purification and contamination control needs in sub-45 nm manufacturing."

When used as part of the Entegris Clarilite Certified solution, the AGPS facilitates product quality by delivering XCDA(r) purge gas to the scanner platforms, reticle stocker environment, and reticle pods, providing a continuous cleansing environment in and around the reticle which helps prevent the formation of haze. This allows for a four-to-five-fold reduction in reticle cleanings, a benefit that dramatically improves output and reduces reticle replacement, and ultimately overall wafer costs.

With the introduction of the 20K system, Entegris now offers a broad range of purification systems from 100 to 20,000 slpm. Each combines increased protection against reticle haze with advanced contamination control technology that delivers the industry's highest outlet purity (measured in sub part-per-trillion levels) and lowest cost of operation.

About Entegris

Entegris is a leading provider of a wide range of products for purifying, protecting and transporting critical materials used in processing and manufacturing in the semiconductor and other high-tech industries. Entegris is ISO 9001 certified and has manufacturing, customer service and/or research facilities in the United States, China, France, Germany, India, Israel, Japan, Malaysia, Singapore, South Korea and Taiwan. Additional information can be found at www.entegris.com.

Entegris, XCDA and Aeronex are registered trademarks of Entegris, Inc. Clarilite and Clarilite Certified are trademarks of Entegris, Inc.



            

Contact Data