EVS to Present at the LD Micro Conference


CAESAREA, Israel, Nov. 20, 2014 (GLOBE NEWSWIRE) -- Elbit Vision Systems Ltd. (OTCBB:EVSNF), a global provider of vision technology for automatic surface inspection and in-line quality monitoring systems, today announced that Mr. John Belew, President of EVS USA, will present at the LD Micro Conference on December 4, 2014.

The conference will take place at the Luxe Sunset Boulevard Hotel in Los Angeles, California. Mr. John Belew, EVS USA's President, is scheduled to present at 9am Pacific Time on December 4, 2014.

At the conference there will be an opportunity for investors to meet one-on-one with Mr. John Belew. Interested investors should contact the conference organizers at LD Micro, or the Investor Relations team at EVS at evs@gkir.com.

About Elbit Vision Systems Ltd. (EVS): www.evs.co.il

EVS offers a broad portfolio of automatic State-of-the-Art Visual Inspection Systems for both in-line and off-line applications, and process monitoring systems used to improve product quality, safety, and increase production efficiency. EVS' systems are used by over 800 customers, many of which are leading global companies.

This press release and other releases are available on www.evs.co.il

Safe Harbor Statement

This press release contains forward-looking statements. Such statements are subject to certain risks and uncertainties, such as market acceptance of new products and our ability to execute production on orders, which could cause actual results to differ materially from those in the statements included in this press release. Although EVS believes that the expectations reflected in such forward-looking statements are based on reasonable assumptions, it can give no assurance that its expectations will be achieved. EVS disclaims any intention or obligation to update or revise any forward-looking statements, which speak only as of the date hereof, whether as a result of new information, future events or otherwise. EVS undertakes no obligation to update forward-looking statements to reflect subsequently occurring events or circumstances.



            

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