Cabot Microelectronics to Present at the 4th Annual Needham Advanced Industrial Technologies Conference


Aurora, IL, July 30, 2015 (GLOBE NEWSWIRE) -- Cabot Microelectronics Corporation (Nasdaq: CCMP), the world's leading supplier of chemical mechanical planarization (CMP) polishing slurries and a growing CMP pad supplier to the semiconductor industry, announced today that it is scheduled to present at the 4th Annual Needham Advanced Industrial Technologies Conference in New York at 2:30 p.m. Eastern Time on Thursday, August 6, 2015. Forward looking and other material information may be discussed during the presentation. A live webcast and replay of the presentation will be available in the Investor Relations section of the company’s website at www.cabotcmp.com. For more information, or to arrange a meeting with management, please contact your Needham representative, or Trisha Tuntland of Cabot Microelectronics at investor_relations@cabotcmp.com.

 

ABOUT CABOT MICROELECTRONICS CORPORATION

Cabot Microelectronics Corporation, headquartered in Aurora, Illinois, is the world's leading supplier of CMP polishing slurries and a growing CMP pad supplier to the semiconductor industry. The company's products play a critical role in the production of advanced semiconductor devices, enabling the manufacture of smaller, faster and more complex devices by its customers. The company's mission is to create value by developing reliable and innovative solutions, through close customer collaboration, that solve today's challenges and help enable tomorrow's technology. The company has approximately 1,025 employees on a global basis. For more information about Cabot Microelectronics Corporation, visit www.cabotcmp.com or contact Trisha Tuntland, Director of Investor Relations at 630-499-2600.


            

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