An engineer with a chamber for Lam Research's Selis®, a product in its selective etch portfolio. Selis uniquely employs both radical and thermal etch capabilities to enable ultra-high selective etching with uniform top to bottom process control without causing damage to the wafer structure.
An engineer with a chamber for Lam Research's Selis®, a product in its selective etch portfolio. Selis uniquely employs both radical and thermal etch capabilities to enable ultra-high selective etching with uniform top to bottom process control without causing damage to the wafer structure.