memsstar Offers New Plasma-Free MacEtch Technology

memsstar's ORBIS platform enables the new vapour-phase MacEtch technology

New vacuum vapour-phase metal-assisted chemical etching (MacEtch) technology, developed in collaboration with the Paul Scherrer Institute (PSI) and Fraunhofer ENAS, is implemented on memsstar’s ORBIS wafer-processing platform.

Format

JPEG

Source

memsstar Limited

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