Global Extreme Ultraviolet Lithography (EUVL) Market to Witness a CAGR of 9.7% During 2018 to 2024: Energias Market Research  


NEW YORK, March 27, 2018 (GLOBE NEWSWIRE) -- The Global Extreme Ultraviolet Lithography (EUVL) Market is expected to grow from USD 759.8 Million in 2017 to USD 1,453.06 Million in 2024 at a CAGR of 9.7% during the forecast period from 2018 to 2024. Factors driving the growth of the market are increasing demand for more efficient and cost effective electronic components, and surging demand for high resolution. Moreover, very short wavelength of EUV also offers high resolution. Higher resolution refers to the printing of small features onto a substrate. The report segments the EUVL market into Light Source (laser produced plasma, vacuum sparks, and gas discharges), Tools (mirrors, photo-masks, vacuum tubes, electrode wheels, Si wafer, multi-layer objects, absorber, and others), Application (light emitting diodes (LEDs), micro-fluidics, micro-needles, memory, IDM, foundry, and others), End-User (biotechnology, consumer electronics, automotive, robotics, aerospace, manufacturing industries, and others), and Region (North America, Europe, Asia-Pacific, Rest of the World). Furthermore, emerging EUVL technology is also anticipated to the replace the optical lithography techniques.

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Extreme Ultraviolet Lithography is one of the next generation techniques of lithography in which a complex pattern is printed with the use of extreme ultraviolet wavelengths that defines integrated circuits onto semiconductor wafer. These ICs hold compact electronic chips with much less power requirements. Extreme ultraviolet lithography uses mirrors in place of lenses, to acquire a phenomenon of reflection, rather than refraction. An extreme UVL finds its application in Light Emitting Diodes (LEDs), micro-fluidics, micro-Needles, biotechnology, memory, IDM, foundry, and others. This technology also offers certain advantages such as compact electronic chips, low power consumption, better output resolution, cost effectiveness, faster fabrication of transistors, and others.

Key Findings of the Global Extreme Ultraviolet Lithography Report:

  • The Extreme Ultraviolet Lithography is expected to reach USD 1,453.1 by 2024 at a CAGR of 9.7%
  • Based on light source:
       •   The laser produced plasma segment was the largest segment in the global extreme ultraviolet lithography in 2017 owing to the short pulse laser beam technology
       •   The vacuum spark segment is expected to be the fastest growing market segment in terms of revenue of the global extreme ultraviolet lithography during the forecast period
  • Based on the tool:
       •   The mirror segment was the largest segment in the global extreme ultraviolet lithography in 2017
  • Based on application:
       •   The memory segment was the largest segment in the global extreme ultraviolet lithography in 2017
  • Based on end-user:
       •   The aerospace segment was the fastest growing segment in the global extreme ultraviolet lithography in 2017
  • Asia-Pacific region is expected to grow at the highest rate during the forecast period owing to rising demand in the consumer electronics sector
  • Asia-Pacific also holds the major share of the global extreme ultraviolet lithography market in 2017

High demand from electronics and automotive industries driving the global extreme ultraviolet lithography market

The demand for extreme ultraviolet lithography is on the rise due to increasing demand for compact ICs among the users globally. Extreme ultraviolet lithography is experiencing high demand from electronics and automotive industries due to several advantages including compact size of ICs, high speed of operation, less installation time, among others. A small wavelength (13.5nm) is employed in this process especially of some nano-meters to get a high resolution. EUVL comprises of concave and convex mirror coated with silicon and such coating can be utilized to reflect around 70% at a 13.4nm wavelength. Rest of the light is absorbed by mirror. This 13nm light is used to enhance the quality of pattern which is projected onto a substrate, thus improving microprocessor speed.

Global Extreme Ultraviolet Lithography Market- Regional Insight

Geographically, the global extreme ultraviolet lithography market is segmented into North America, Asia-Pacific, Europe, and Rest of the World (RoW). Asia-Pacific holds the largest share of the global EUVL market. Moreover, Asia-Pacific is also anticipated to be the fastest growing market during the forecast period. The factor propelling the growth of extreme ultraviolet lithography market in Asia-Pacific region is rising demand in the consumer electronics sector.

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