BELLINGHAM, WA -- (MARKET WIRE) -- March 20, 2007 -- SPIE today announced free downloads of four key technical presentations from the SPIE Advanced Lithography symposium, held 25 February - 2 March 2007 in San Jose, Calif. The multimedia presentations include the three plenary talks and the Virtual Lithography panel discussion, all of which can be viewed on the SPIE Newsroom at

SPIE Advanced Lithography is the leading international event for practitioners of micro- and nanolithography to learn about the latest state-of-the-art applications and techniques, as well as emerging issues and new technologies. This conference brought together more than 4300 speakers, attendees, and exhibitors to exchange information, ideas, and products in optical lithography, metrology, emerging lithographic technologies, resist materials and processing, and design-process integration.

SPIE is making these conference highlights freely available on the Web. "SPIE is experimenting with new ways to bring high-quality technical information to a worldwide audience," said Dr. Eugene Arthurs, Executive Director of SPIE. "While the Web does not match the face-to-face connections and professional opportunities of our live events, many people around the world will benefit from online information delivery."

More than 1200 people attended the live presentations, which cover new technology for semiconductor manufacturing. Johannes Stork, Senior Vice President and CTO of Texas Instruments, presents "Nanoscale Patterning Challenges for CMOS Density Scaling." George Gomba, IBM Distinguished Engineer and Director of Lithography Technology Development at IBM, discusses "Collaborative Innovation: IBM's Immersion Lithography Strategy for 65 nm and 45 nm Half-pitch Nodes & Beyond." The third plenary speaker, Mark Melliar-Smith, CEO of Molecular Imprints, presents "Lithography Beyond 32 nm: A Role for Imprint?"

In the panel discussion called "Virtual Lithography: The Next Generation?" which is chaired by Nigel R. Farrar of Cymer and Mircea V. Dusa of ASML MaskTools, nine experts discuss the outlook for automated algorithms, engineering analysis and simulation driving next-generation lithography. Panelists include: Andy Neureuther, Univ. of California, Berkeley; Alfred Wong, Magma Design Systems; Neal Callan, Brion Technologies, Inc.; Scott Mansfield, IBM Microelectronics Div.; Tatsuhiko Higashiki, Toshiba; Cyrus Tabery, Advanced Micro Devices; Kurt Ronse, IMEC; Steve Renwick, Nikon Precision; and Koichiro Tsujita, Canon.

SPIE acknowledges Mercury Computer Systems and Canon for sponsoring these special events at the SPIE Advanced Lithography conference, and Cymer for sponsoring these video presentations.

SPIE is an international society advancing an interdisciplinary approach to the science and application of light. SPIE organizes events including SPIE Advanced Lithography, Photonics West, Photomask, OptiFab, Defense & Security Symposium, Optics & Photonics, Optics East, Photonics Europe and many others. SPIE also publishes journals, books and conference proceedings, with over 235,000 technical papers available for download via the SPIE Digital Library. See for details.

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